SiOx Deposition on Polypropylene-Coated Paper With a Dielectric Barrier Discharge at Atmospheric Pressure

Na Li, Yui Lun Wu, Jungmi Hong, Ivan A. Shchelkanov, David N Ruzic

Research output: Contribution to journalArticlepeer-review

Abstract

Deposition of transparent oxide films at atmosphere pressure onto polymeric substrates at room temperature is a technique gaining rapid acceptance. These films can be used for numerous applications such as antiscratch and water permeation barrier coatings. In this paper, a ∼ 1.4-μ SiOx layer has been deposited on polypropylene-coated paper at atmosphere pressure with a filamentary dielectric barrier discharge (DBD). The DBD linear discharge was driven by a 30-kHz power supply. Scanning electron microscope, X-ray photoelectron spectroscopy, and attenuated total reflection-Fourier transform infrared spectroscopy were used to characterize the deposited film. The deposited thin film decreased water permeation through the paper by ∼15%.

Original languageEnglish (US)
Article number7182351
Pages (from-to)3205-3210
Number of pages6
JournalIEEE Transactions on Plasma Science
Volume43
Issue number9
DOIs
StatePublished - Sep 1 2015

Keywords

  • Atmospheric pressure plasma deposition
  • SiOx film
  • dielectric barrier discharge (DBD)
  • polypropylene (PP)

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

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