Deposition of transparent oxide films at atmosphere pressure onto polymeric substrates at room temperature is a technique gaining rapid acceptance. These films can be used for numerous applications such as antiscratch and water permeation barrier coatings. In this paper, a ∼ 1.4-μ SiOx layer has been deposited on polypropylene-coated paper at atmosphere pressure with a filamentary dielectric barrier discharge (DBD). The DBD linear discharge was driven by a 30-kHz power supply. Scanning electron microscope, X-ray photoelectron spectroscopy, and attenuated total reflection-Fourier transform infrared spectroscopy were used to characterize the deposited film. The deposited thin film decreased water permeation through the paper by ∼15%.
- Atmospheric pressure plasma deposition
- SiOx film
- dielectric barrier discharge (DBD)
- polypropylene (PP)
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Condensed Matter Physics