Abstract
Deposition of transparent oxide films at atmosphere pressure onto polymeric substrates at room temperature is a technique gaining rapid acceptance. These films can be used for numerous applications such as antiscratch and water permeation barrier coatings. In this paper, a ∼ 1.4-μ SiOx layer has been deposited on polypropylene-coated paper at atmosphere pressure with a filamentary dielectric barrier discharge (DBD). The DBD linear discharge was driven by a 30-kHz power supply. Scanning electron microscope, X-ray photoelectron spectroscopy, and attenuated total reflection-Fourier transform infrared spectroscopy were used to characterize the deposited film. The deposited thin film decreased water permeation through the paper by ∼15%.
Original language | English (US) |
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Article number | 7182351 |
Pages (from-to) | 3205-3210 |
Number of pages | 6 |
Journal | IEEE Transactions on Plasma Science |
Volume | 43 |
Issue number | 9 |
DOIs | |
State | Published - Sep 1 2015 |
Keywords
- Atmospheric pressure plasma deposition
- SiOx film
- dielectric barrier discharge (DBD)
- polypropylene (PP)
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Condensed Matter Physics