SiOx Deposition on Polypropylene-Coated Paper With a Dielectric Barrier Discharge at Atmospheric Pressure

Na Li; Yui Lun Wu; Jungmi Hong; Ivan A. Shchelkanov; David N Ruzic

doi:10.1109/TPS.2015.2459720

SiO_x Deposition on Polypropylene-Coated Paper With a Dielectric Barrier Discharge at Atmospheric Pressure

Na Li, Yui Lun Wu, Jungmi Hong, Ivan A. Shchelkanov, David N Ruzic

Research output: Contribution to journal › Article › peer-review

Abstract

Deposition of transparent oxide films at atmosphere pressure onto polymeric substrates at room temperature is a technique gaining rapid acceptance. These films can be used for numerous applications such as antiscratch and water permeation barrier coatings. In this paper, a ∼ 1.4-μ SiO_x layer has been deposited on polypropylene-coated paper at atmosphere pressure with a filamentary dielectric barrier discharge (DBD). The DBD linear discharge was driven by a 30-kHz power supply. Scanning electron microscope, X-ray photoelectron spectroscopy, and attenuated total reflection-Fourier transform infrared spectroscopy were used to characterize the deposited film. The deposited thin film decreased water permeation through the paper by ∼15%.

Original language	English (US)
Article number	7182351
Pages (from-to)	3205-3210
Number of pages	6
Journal	IEEE Transactions on Plasma Science
Volume	43
Issue number	9
DOIs	https://doi.org/10.1109/TPS.2015.2459720
State	Published - Sep 1 2015

Keywords

Atmospheric pressure plasma deposition
SiOx film
dielectric barrier discharge (DBD)
polypropylene (PP)

ASJC Scopus subject areas

Nuclear and High Energy Physics
Condensed Matter Physics

Online availability

10.1109/TPS.2015.2459720

Library availability

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Cite this

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title = "SiOx Deposition on Polypropylene-Coated Paper With a Dielectric Barrier Discharge at Atmospheric Pressure",

abstract = "Deposition of transparent oxide films at atmosphere pressure onto polymeric substrates at room temperature is a technique gaining rapid acceptance. These films can be used for numerous applications such as antiscratch and water permeation barrier coatings. In this paper, a ∼ 1.4-μ SiOx layer has been deposited on polypropylene-coated paper at atmosphere pressure with a filamentary dielectric barrier discharge (DBD). The DBD linear discharge was driven by a 30-kHz power supply. Scanning electron microscope, X-ray photoelectron spectroscopy, and attenuated total reflection-Fourier transform infrared spectroscopy were used to characterize the deposited film. The deposited thin film decreased water permeation through the paper by ∼15%.",

keywords = "Atmospheric pressure plasma deposition, SiOx film, dielectric barrier discharge (DBD), polypropylene (PP)",

author = "Na Li and Wu, {Yui Lun} and Jungmi Hong and Shchelkanov, {Ivan A.} and Ruzic, {David N}",

note = "Funding Information: This work was supported in part by the National Science Foundation Industry/University Cooperative Research Center for Laser and Plasma for Advanced Manufacturing and in part by William Wrigley Jr. Company under Award 2011-00062. Publisher Copyright: {\textcopyright} 2015 IEEE.",

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AU - Wu, Yui Lun

AU - Hong, Jungmi

AU - Shchelkanov, Ivan A.

AU - Ruzic, David N

N1 - Funding Information: This work was supported in part by the National Science Foundation Industry/University Cooperative Research Center for Laser and Plasma for Advanced Manufacturing and in part by William Wrigley Jr. Company under Award 2011-00062. Publisher Copyright: © 2015 IEEE.

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AB - Deposition of transparent oxide films at atmosphere pressure onto polymeric substrates at room temperature is a technique gaining rapid acceptance. These films can be used for numerous applications such as antiscratch and water permeation barrier coatings. In this paper, a ∼ 1.4-μ SiOx layer has been deposited on polypropylene-coated paper at atmosphere pressure with a filamentary dielectric barrier discharge (DBD). The DBD linear discharge was driven by a 30-kHz power supply. Scanning electron microscope, X-ray photoelectron spectroscopy, and attenuated total reflection-Fourier transform infrared spectroscopy were used to characterize the deposited film. The deposited thin film decreased water permeation through the paper by ∼15%.

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