Simultaneous short-range smoothening and global roughening during growth of hydrogenated amorphous silicon films

Keyphrases

• Atomic Force Microscopy 100%
• Hydrogenated Amorphous Silicon Films 100%
• Power Spectrum Density 100%
• Hot Filament Chemical Vapor Deposition (HFCVD) 50%
• Surface Diffusion 50%
• Atomic Force 50%
• Amorphous Silicon Thin Film 50%
• Surface Morphology 50%
• Microscopy Data 50%
• Ellipsometry 50%
• Growth Areas 50%
• Post Deposition 50%
• Self-shadowing 50%
• In Situ Spectroscopic Ellipsometry 50%
• Columnar Growth 50%
• Rough Substrate 50%

Engineering

• Atomic Force Microscopy 100%
• Power Spectra 100%
• Hydrogenated Amorphous Silicon 100%
• Spectrum Density 100%
• Chemical Vapor Deposition 50%
• Vapor Deposition 50%
• Film Silicon 50%
• Surface Morphology 50%
• Growth Surface 50%

Material Science

• Film 100%
• Amorphous Silicon 100%
• Density 66%
• Surface (Surface Science) 66%
• Atomic Force Microscopy 66%
• Surface Diffusion 33%
• Chemical Vapor Deposition 33%
• Surface Morphology 33%