We report simultaneous measurements of thermal conductivity and Seebeck coefficient on array-scale silicon nanowires fabricated by metal assisted chemical etching. The measurements are conducted on the solid and the mesoporous nanowire arrays (NWAs) obtained from etching 1 ohm-cm and 0.002 ohm-cm Si substrates respectively. We demonstrate control on sidewall morphology and doping of the arrays that have an aspect ratio up to 20 and 30% areal coverage. We employ differential frequency-domain measurements, separately on the array and the corresponding substrate to obtain the temperature drop and Seebeck voltage contribution of the nanowire array. The technique is validated by measurements on bulk silicon across the resistivity 0.002-1 ohm-cm. The Seebeck measurements reveal quenching of the phonon drag in the nanowires in comparison to the bulk in the measured temperature range of 300 K- 500 K. The Seebeck coefficient shows a ∼18% decrease in the solid NWAs and ∼22% increase in the mesoporous NWAs at room temperature. The thermal conductivity is close to Casimir limit for the solid wires while it drops to ∼2.5 W/mK in the mesoporous nanowires.