Simulation of droplet-gas interactions in an inductively coupled plasma using the direct simulation Monte Carlo method

The evaporation rate of sample droplets in an inductively coupled plasma is investigated through the development of two models using the direct simulation Monte Carlo technique. A standard continuum evaporation model is first described and used to obtain desolvation rates for droplets under a variety of initial conditions. The results from the continuum model sure contrasted with a kinetic technique designed to obtain correct results over a large range of Knudsen numbers. The droplet evaporation rates predicted by the desolvation model are found to be in agreement with those of previous studies. We present the first predicted spatial distribution of droplet concentrations and evaporation rates in an ICP flow.