Simulation of a Long Term Memory Device with a Full Bandstructure Monte Carlo Approach

Christopher H. Lee, Umberto Ravaioli, Karl Hess, Carver A. Mead, Paul Hasler

Research output: Contribution to journalArticlepeer-review


Simulations of charging characteristics of a long term memory device, based on a floating gate structure, are presented. The analysis requires the inclusion of hot electron effects and a detailed account of the semiconductor bandstructure, because device operation is based on the injection of electrons into the gate oxide high above the silicon conduction band edge. We have developed a Monte Carlo simulator based on a full bandstructure approach which accurately accounts for the high energy tail of the electron distribution function. For practical simulation of the prototype structure, with 3.0-µm source-drain separation, the simulator is used as a post-processor on the potential profile obtained from a PISCES IIB drift-diffusion solution. The computations are in quantitative agreement with experimental results for the gate injection current, measured at fixed drain and gate biases.

Original languageEnglish (US)
Pages (from-to)360-362
Number of pages3
JournalIEEE Electron Device Letters
Issue number8
StatePublished - Aug 1995

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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