Abstract
Amorphous selenium is one of the best photoconductors with a wide range of applications, from its early use in the photocopy industry to its present application in X-ray imaging. Low melting point and high vapor pressure of amorphous selenium enable uniform and economical deposition of this photoconductive material up to few millimeters thick. However, there is a tradeoff between deposition rate and film uniformity. In this article, a thermal evaporation system for amorphous selenium deposition was developed. The system geometry was simulated to determine the optimized source-substrate throw distance for uniform film thickness of amorphous selenium (a-Se) on a substrate with up to 4-in diameter. Boat and crucible source configurations of equal volume (100 cc) were tested. The film was fabricated, characterized, and the uniformity and thickness were measured and compared with simulation results.
Original language | English (US) |
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Article number | 9321339 |
Pages (from-to) | 626-631 |
Number of pages | 6 |
Journal | IEEE Transactions on Electron Devices |
Volume | 68 |
Issue number | 2 |
DOIs | |
State | Published - Feb 2021 |
Keywords
- Amorphous selenium
- film deposition
- thermal evaporation
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering