Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points

Folkert Horst, William M.J. Green, Bert Jan Offrein, Yurii A. Vlasov

Research output: Contribution to journalArticlepeer-review

Abstract

We present ultracompact integrated optical echelle grating wavelength-division-multiplexing (de)multiplexers for on-chip optical networks, fabricated using high-index-contrast silicon-on-insulator photonic waveguide technology. These devices are based on a design with two stigmatic points, which enables compact geometries with reduced aberrations. In the example presented here, this design allows us to achieve an eight-channel (de)multlplexer with 3.2-nm channel spacing, within an ultracompact footprint of 250 × 200 μm. The channel-to-channel isolation of the devices is 19 dB. The minimum insertion loss, relative to a straight waveguide, is 3 dB with a channel-to-channel variation of 0.5 dB.

Original languageEnglish (US)
Pages (from-to)1743-1745
Number of pages3
JournalIEEE Photonics Technology Letters
Volume21
Issue number23
DOIs
StatePublished - Dec 1 2009
Externally publishedYes

Keywords

  • Demultiplexing
  • Gratings
  • Optical planar waveguide components
  • Optics
  • Silicon-on-insulator (soi) technology
  • Wavelength-division multiplexing (wdm)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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