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SiH
4
on TiSi
2
: an investigation of gas adsorption on metal-like compounds
R. P. Southwell,
E. G. Seebauer
Chemical and Biomolecular Engineering
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peer-review
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Dive into the research topics of 'SiH
4
on TiSi
2
: an investigation of gas adsorption on metal-like compounds'. Together they form a unique fingerprint.
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Keyphrases
Silane
100%
TiSi2
100%
Gas Adsorption
100%
Chemical Vapor Deposition
20%
Desorption
20%
Co-adsorption
20%
Electrical Conductivity
20%
Non-metallic
20%
Two-source
20%
Titanium Tetrachloride
20%
Full Width at Half Maximum
20%
First-order
20%
Temperature Programmed Desorption
20%
Coverage Increase
20%
Typical Metals
20%
Adsorption-desorption Kinetics
20%
Gaussian Distribution
20%
Non-metal
20%
Source Gas
20%
Desorption Energy
20%
Titanium Disilicide
20%
Kinetic Shift
20%
Chemistry
Desorption
100%
Adsorption of Gases
100%
Titanium
33%
Chemical Vapor Deposition
33%
Gaussian Distribution
33%
Sorption
33%
Material Science
Desorption
100%
Electrical Conductivity
25%
Chemical Vapor Deposition
25%
Titanium
25%