Shear strength measurements of hafnium diboride thin solid films

Jungkyu Lee, Kyriaki Polychronopoulou, Andrew N. Cloud, John R. Abelson, Andreas A. Polycarpou

Research output: Contribution to journalArticlepeer-review


Micromechanical and microscratch properties of chemical vapor deposition synthesized hafnium diboride thin solid films were measured. A range of synthesis conditions was explored by varying the substrate temperature, precursor pressure, and ex situ annealing conditions. Adhesion and shear strength measurements were performed using indentation and scratch techniques, respectively. The hardness of the as-deposited and annealed films was found to be in the 7-22. GPa and 6-32. GPa range, respectively. Scratch studies revealed a coefficient of friction of 0.13-0.21 depending on the deposition and annealing conditions with the as-deposited films exhibiting lower coefficient of friction. The adhesion strength was found to increase twofold to threefold with annealing, while annealing has no impact on the shear strength of the films.

Original languageEnglish (US)
Pages (from-to)168-176
Number of pages9
Issue number1-2
StatePublished - Oct 15 2014


  • Coating
  • Delamination
  • Hardness
  • Shear strength
  • Thin film

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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