Sensing Sub-10 nm Wide Perturbations in Background Nanopatterns Using Optical Pseudoelectrodynamics Microscopy (OPEM)

Keyphrases

• Nanopatterning 100%
• Microscopy 100%
• Light-matter Interaction 100%
• Sub-10 Nm 100%
• Semiconductors 50%
• Wafer 50%
• Imaging Methods 50%
• Mechanical Force 50%
• Non-destructive 50%
• Material Analysis 50%
• Intrinsic Properties 50%
• Light Property 50%
• Wideband Sources 50%
• Rayleigh Scattering 50%
• Electrodynamics 50%
• Diffraction Limit 50%
• Visible Light 50%
• Bioimaging 50%
• Bright Field Microscope 50%
• Deep Subwavelength 50%
• Nanometrology 50%
• Mechanical Work 50%
• Non-interference 50%
• Far-field Imaging 50%
• Through-focus 50%

Engineering

• Nanoscale 100%
• Image Analysis 50%
• Diffraction Limit 50%
• Intrinsic Property 50%
• Broadband Source 50%
• Nanometrology 50%
• Bright Light 50%