Self-aligned double patterning decomposition for overlay minimization and hot spot detection

Hongbo Zhang, Yuelin Du, Martin D F Wong, Rasit Topaloglu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

Original languageEnglish (US)
Title of host publication2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011
Pages71-76
Number of pages6
StatePublished - Sep 16 2011
Event2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011 - San Diego, CA, United States
Duration: Jun 5 2011Jun 9 2011

Publication series

NameProceedings - Design Automation Conference
ISSN (Print)0738-100X

Other

Other2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011
CountryUnited States
CitySan Diego, CA
Period6/5/116/9/11

Fingerprint

Double Patterning
Hot Spot
Overlay
Layout
Decomposition
Decompose
Minimise
Problem Decomposition
Decomposable
Lithography
Open Problems
Cell
Experimental Results

Keywords

  • 2D decomposition
  • ILP
  • SADP
  • hot-spot detection
  • overlay minimization

ASJC Scopus subject areas

  • Computer Science Applications
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Modeling and Simulation

Cite this

Zhang, H., Du, Y., Wong, M. D. F., & Topaloglu, R. (2011). Self-aligned double patterning decomposition for overlay minimization and hot spot detection. In 2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011 (pp. 71-76). [5981704] (Proceedings - Design Automation Conference).

Self-aligned double patterning decomposition for overlay minimization and hot spot detection. / Zhang, Hongbo; Du, Yuelin; Wong, Martin D F; Topaloglu, Rasit.

2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011. 2011. p. 71-76 5981704 (Proceedings - Design Automation Conference).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhang, H, Du, Y, Wong, MDF & Topaloglu, R 2011, Self-aligned double patterning decomposition for overlay minimization and hot spot detection. in 2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011., 5981704, Proceedings - Design Automation Conference, pp. 71-76, 2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011, San Diego, CA, United States, 6/5/11.
Zhang H, Du Y, Wong MDF, Topaloglu R. Self-aligned double patterning decomposition for overlay minimization and hot spot detection. In 2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011. 2011. p. 71-76. 5981704. (Proceedings - Design Automation Conference).
Zhang, Hongbo ; Du, Yuelin ; Wong, Martin D F ; Topaloglu, Rasit. / Self-aligned double patterning decomposition for overlay minimization and hot spot detection. 2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011. 2011. pp. 71-76 (Proceedings - Design Automation Conference).
@inproceedings{e412c489cc2440538aadfed28756eebb,
title = "Self-aligned double patterning decomposition for overlay minimization and hot spot detection",
abstract = "Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.",
keywords = "2D decomposition, ILP, SADP, hot-spot detection, overlay minimization",
author = "Hongbo Zhang and Yuelin Du and Wong, {Martin D F} and Rasit Topaloglu",
year = "2011",
month = "9",
day = "16",
language = "English (US)",
isbn = "9781450306362",
series = "Proceedings - Design Automation Conference",
pages = "71--76",
booktitle = "2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011",

}

TY - GEN

T1 - Self-aligned double patterning decomposition for overlay minimization and hot spot detection

AU - Zhang, Hongbo

AU - Du, Yuelin

AU - Wong, Martin D F

AU - Topaloglu, Rasit

PY - 2011/9/16

Y1 - 2011/9/16

N2 - Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

AB - Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

KW - 2D decomposition

KW - ILP

KW - SADP

KW - hot-spot detection

KW - overlay minimization

UR - http://www.scopus.com/inward/record.url?scp=80052674745&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80052674745&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:80052674745

SN - 9781450306362

T3 - Proceedings - Design Automation Conference

SP - 71

EP - 76

BT - 2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011

ER -