Self-aligned double patterning decomposition for overlay minimization and hot spot detection

Hongbo Zhang, Yuelin Du, Martin D.F. Wong, Rasit Topaloglu

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Self-aligned double patterning (SADP) lithography is a promising technology which can reduce the overlay and print 2D features for sub-32nm process. Yet, how to decompose a layout to minimize the overlay and perform hot spot detection is still an open problem. In this paper, we present an algorithm that can optimally solve the SADP decomposition problem. For a decomposable layout, our algorithm guarantees to find a decomposition solution that minimizes overlay. For a non-decomposable layout our algorithm guarantees to find all hot spots. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger testcases are also provided with competitive run-times.

Original languageEnglish (US)
Title of host publication2011 48th ACM/EDAC/IEEE Design Automation Conference, DAC 2011
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages6
ISBN (Print)9781450306362
StatePublished - 2011

Publication series

NameProceedings - Design Automation Conference
ISSN (Print)0738-100X


  • 2D decomposition
  • ILP
  • SADP
  • hot-spot detection
  • overlay minimization

ASJC Scopus subject areas

  • Computer Science Applications
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Modeling and Simulation


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