Abstract
Photonic crystal microcavity devices containing InGaAs active layers grown on GaAs substrates have demonstrated poor performance largely because of rapid, non-radiative recombination at the air-InGaAs interface formed during the fabrication of the photonic crystal slab. We have used selective area epitaxial regrowth of the quantum well active layer to localize it to the defect of the photonic crystal structure. The fabrication process is described and the potential application to resonant photonic crystal devices is discussed.
Original language | English (US) |
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Article number | 09 |
Pages (from-to) | 86-93 |
Number of pages | 8 |
Journal | Progress in Biomedical Optics and Imaging - Proceedings of SPIE |
Volume | 5729 |
DOIs | |
State | Published - 2005 |
Event | Optoelectronic Integrated Circuits VII - San Jose, CA, United States Duration: Jan 25 2005 → Jan 27 2005 |
Keywords
- GaAs
- InGaAs
- Photonic crystal
- Quantum well
- Selective area epitaxy
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Biomaterials
- Radiology Nuclear Medicine and imaging