Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Michael A. Jaworski, Michael J. Williams, Erik L. Antonsen, Brian E. Jurczyk, David N. Ruzic, Robert Bristol

Research output: Contribution to journalConference articlepeer-review


A 52 MHz RF system has been installed and tested on the IDEAL chamber. The secondary plasma source will be used in conjunction with other methods to mitigate debris from an EUV source. The plasmas are produced by a quarter-wavelength helical resonator antenna contained within a faraday shield. Argon and helium gases have both been tested in the system and have been shown to produce plasmas with densities as high as 8 × 1011 cm -3 with input powers up to 800 W. Input power to the system is limited by internal geometry and connections to the antenna housing.

Original languageEnglish (US)
Article number104
Pages (from-to)852-858
Number of pages7
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Issue numberII
StatePublished - Sep 19 2005
EventEmerging Lithographic Technologies IX - San Jose, CA, United States
Duration: Mar 1 2005Mar 3 2005


  • Debris
  • EUV source
  • Immersed antenna
  • Mitigation
  • Secondary plasma

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging


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