Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Michael A. Jaworski; Michael J. Williams; Erik L. Antonsen; Brian E. Jurczyk; David N. Ruzic; Robert Bristol

doi:10.1117/12.600059

Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Michael A. Jaworski, Michael J. Williams, Erik L. Antonsen, Brian E. Jurczyk, David N. Ruzic, Robert Bristol

Research output: Contribution to journal › Conference article › peer-review

Abstract

A 52 MHz RF system has been installed and tested on the IDEAL chamber. The secondary plasma source will be used in conjunction with other methods to mitigate debris from an EUV source. The plasmas are produced by a quarter-wavelength helical resonator antenna contained within a faraday shield. Argon and helium gases have both been tested in the system and have been shown to produce plasmas with densities as high as 8 × 10¹¹ cm ^-3 with input powers up to 800 W. Input power to the system is limited by internal geometry and connections to the antenna housing.

Original language	English (US)
Article number	104
Pages (from-to)	852-858
Number of pages	7
Journal	Progress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume	5751
Issue number	II
DOIs	https://doi.org/10.1117/12.600059
State	Published - Sep 19 2005
Event	Emerging Lithographic Technologies IX - San Jose, CA, United States Duration: Mar 1 2005 → Mar 3 2005

Keywords

Debris
EUV source
Immersed antenna
Mitigation
Secondary plasma

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Biomaterials
Atomic and Molecular Physics, and Optics
Radiology Nuclear Medicine and imaging

Online availability

10.1117/12.600059

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Cite this

@article{45c5bf2986184c34a6efb61904064f6f,

title = "Secondary RF plasma system for mitigation of EUV source debris and advanced fuels",

abstract = "A 52 MHz RF system has been installed and tested on the IDEAL chamber. The secondary plasma source will be used in conjunction with other methods to mitigate debris from an EUV source. The plasmas are produced by a quarter-wavelength helical resonator antenna contained within a faraday shield. Argon and helium gases have both been tested in the system and have been shown to produce plasmas with densities as high as 8 × 1011 cm -3 with input powers up to 800 W. Input power to the system is limited by internal geometry and connections to the antenna housing.",

keywords = "Debris, EUV source, Immersed antenna, Mitigation, Secondary plasma",

author = "Jaworski, {Michael A.} and Williams, {Michael J.} and Antonsen, {Erik L.} and Jurczyk, {Brian E.} and Ruzic, {David N.} and Robert Bristol",

year = "2005",

month = sep,

day = "19",

doi = "10.1117/12.600059",

language = "English (US)",

volume = "5751",

pages = "852--858",

journal = "Progress in Biomedical Optics and Imaging - Proceedings of SPIE",

issn = "1605-7422",

publisher = "SPIE",

number = "II",

note = "Emerging Lithographic Technologies IX ; Conference date: 01-03-2005 Through 03-03-2005",

}

TY - JOUR

T1 - Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

AU - Jaworski, Michael A.

AU - Williams, Michael J.

AU - Antonsen, Erik L.

AU - Jurczyk, Brian E.

AU - Ruzic, David N.

AU - Bristol, Robert

PY - 2005/9/19

Y1 - 2005/9/19

N2 - A 52 MHz RF system has been installed and tested on the IDEAL chamber. The secondary plasma source will be used in conjunction with other methods to mitigate debris from an EUV source. The plasmas are produced by a quarter-wavelength helical resonator antenna contained within a faraday shield. Argon and helium gases have both been tested in the system and have been shown to produce plasmas with densities as high as 8 × 1011 cm -3 with input powers up to 800 W. Input power to the system is limited by internal geometry and connections to the antenna housing.

AB - A 52 MHz RF system has been installed and tested on the IDEAL chamber. The secondary plasma source will be used in conjunction with other methods to mitigate debris from an EUV source. The plasmas are produced by a quarter-wavelength helical resonator antenna contained within a faraday shield. Argon and helium gases have both been tested in the system and have been shown to produce plasmas with densities as high as 8 × 1011 cm -3 with input powers up to 800 W. Input power to the system is limited by internal geometry and connections to the antenna housing.

KW - Debris

KW - EUV source

KW - Immersed antenna

KW - Mitigation

KW - Secondary plasma

UR - http://www.scopus.com/inward/record.url?scp=24644512804&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=24644512804&partnerID=8YFLogxK

U2 - 10.1117/12.600059

DO - 10.1117/12.600059

M3 - Conference article

AN - SCOPUS:24644512804

SN - 1605-7422

VL - 5751

SP - 852

EP - 858

JO - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

JF - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

IS - II

M1 - 104

T2 - Emerging Lithographic Technologies IX

Y2 - 1 March 2005 through 3 March 2005

ER -

Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Abstract

Keywords

ASJC Scopus subject areas

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