Second-harmonic patterned polarization-analyzed reflection confocal microscope

Kimani C Toussaint (Inventor), Chukwuemeka O Okoro (Inventor)

Research output: Patent

Abstract

The disclosure is directed to a method and apparatus for performing patterned microscopy. The method includes obtaining a microscopy image of an object based on optical signal from the object in response to a first incoming optical beam; and obtaining a contrast-enhancing image based on optical signal from the object in response to a second incoming optical beam. The method also includes generating a patterned mask based on the contrast-enhancing image. The method further includes applying the patterned mask on the microscopy image to obtain a patterned microscopy image. The microscopy image includes a polarization-analyzed reflection confocal microscopy image. The contrast-enhancing image includes a second-harmonic generation microscopy image. The patterned microscopy image includes a second-harmonic patterned polarization-analyzed reflection confocal microscopy image.
Original languageEnglish (US)
U.S. patent number11010881
StatePublished - May 18 2021

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