Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering

Tomas Polakovic; Sergi Lendinez; John E. Pearson; Axel Hoffmann; Volodymyr Yefremenko; Clarence L. Chang; Whitney Armstrong; Kawtar Hafidi; Goran Karapetrov; Valentine Novosad

doi:10.1063/1.5031904

Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering

Tomas Polakovic, Sergi Lendinez, John E. Pearson, Axel Hoffmann, Volodymyr Yefremenko, Clarence L. Chang, Whitney Armstrong, Kawtar Hafidi, Goran Karapetrov, Valentine Novosad

Research output: Contribution to journal › Article › peer-review

Abstract

We use room temperature ion beam assisted sputtering to deposit niobium nitride thin films. Electrical and structural characterizations were performed by electric transport and magnetization measurements at variable temperatures, X-ray diffraction, and atomic force microscopy. Compared to reactive sputtering of niobium nitride, films sputtered in the presence of an ion beam show a remarkable increase in the superconducting critical temperature T_c, while exhibiting lower sensitivity to nitrogen concentration during deposition. Thickness dependence of the superconducting critical temperature is comparable to films prepared by conventional methods at high substrate temperatures and is consistent with behavior driven by quantum size effects or weak localization.

Original language	English (US)
Article number	076107
Journal	APL Materials
Volume	6
Issue number	7
DOIs	https://doi.org/10.1063/1.5031904
State	Published - Jul 1 2018
Externally published	Yes

ASJC Scopus subject areas

General Materials Science
General Engineering

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10.1063/1.5031904

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title = "Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering",

abstract = "We use room temperature ion beam assisted sputtering to deposit niobium nitride thin films. Electrical and structural characterizations were performed by electric transport and magnetization measurements at variable temperatures, X-ray diffraction, and atomic force microscopy. Compared to reactive sputtering of niobium nitride, films sputtered in the presence of an ion beam show a remarkable increase in the superconducting critical temperature Tc, while exhibiting lower sensitivity to nitrogen concentration during deposition. Thickness dependence of the superconducting critical temperature is comparable to films prepared by conventional methods at high substrate temperatures and is consistent with behavior driven by quantum size effects or weak localization.",

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doi = "10.1063/1.5031904",

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T1 - Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering

AU - Polakovic, Tomas

AU - Lendinez, Sergi

AU - Pearson, John E.

AU - Hoffmann, Axel

AU - Yefremenko, Volodymyr

AU - Chang, Clarence L.

AU - Armstrong, Whitney

AU - Hafidi, Kawtar

AU - Karapetrov, Goran

AU - Novosad, Valentine

PY - 2018/7/1

Y1 - 2018/7/1

N2 - We use room temperature ion beam assisted sputtering to deposit niobium nitride thin films. Electrical and structural characterizations were performed by electric transport and magnetization measurements at variable temperatures, X-ray diffraction, and atomic force microscopy. Compared to reactive sputtering of niobium nitride, films sputtered in the presence of an ion beam show a remarkable increase in the superconducting critical temperature Tc, while exhibiting lower sensitivity to nitrogen concentration during deposition. Thickness dependence of the superconducting critical temperature is comparable to films prepared by conventional methods at high substrate temperatures and is consistent with behavior driven by quantum size effects or weak localization.

AB - We use room temperature ion beam assisted sputtering to deposit niobium nitride thin films. Electrical and structural characterizations were performed by electric transport and magnetization measurements at variable temperatures, X-ray diffraction, and atomic force microscopy. Compared to reactive sputtering of niobium nitride, films sputtered in the presence of an ion beam show a remarkable increase in the superconducting critical temperature Tc, while exhibiting lower sensitivity to nitrogen concentration during deposition. Thickness dependence of the superconducting critical temperature is comparable to films prepared by conventional methods at high substrate temperatures and is consistent with behavior driven by quantum size effects or weak localization.

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Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering

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