Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering

Tomas Polakovic, Sergi Lendinez, John E. Pearson, Axel Hoffmann, Volodymyr Yefremenko, Clarence L. Chang, Whitney Armstrong, Kawtar Hafidi, Goran Karapetrov, Valentine Novosad

Research output: Contribution to journalArticle

Abstract

We use room temperature ion beam assisted sputtering to deposit niobium nitride thin films. Electrical and structural characterizations were performed by electric transport and magnetization measurements at variable temperatures, X-ray diffraction, and atomic force microscopy. Compared to reactive sputtering of niobium nitride, films sputtered in the presence of an ion beam show a remarkable increase in the superconducting critical temperature Tc, while exhibiting lower sensitivity to nitrogen concentration during deposition. Thickness dependence of the superconducting critical temperature is comparable to films prepared by conventional methods at high substrate temperatures and is consistent with behavior driven by quantum size effects or weak localization.

Original languageEnglish (US)
Article number076107
JournalAPL Materials
Volume6
Issue number7
DOIs
StatePublished - Jul 1 2018
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

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    Polakovic, T., Lendinez, S., Pearson, J. E., Hoffmann, A., Yefremenko, V., Chang, C. L., Armstrong, W., Hafidi, K., Karapetrov, G., & Novosad, V. (2018). Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering. APL Materials, 6(7), [076107]. https://doi.org/10.1063/1.5031904