Keyphrases
Average Grain Size
50%
Crystal Growth
100%
Crystal Stability
50%
Defect Concentration
50%
Diverse Applications
50%
Electron Acceleration
50%
Enhanced Diffusion
50%
Epitaxial
50%
Film Defects
50%
Film Properties
50%
Growth Kinetics
50%
Ion Bombardment
100%
Ion Deposition
50%
Ion Irradiation
50%
Ion-surface Interaction
100%
Large Gap
50%
Low Energy
50%
Low-energy Ions
100%
Magnetic Recording
50%
Microchemistry
50%
Microelectronics
50%
Microstructure
50%
Model Experimental
50%
Nucleation Kinetics
100%
Optical Coatings
50%
Phase Stability
50%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
50%
Polycrystalline Films
50%
Preferential Sputtering
50%
Preferred Orientation
50%
Single-crystalline Films
50%
Surface Segregation
50%
Thin Film Deposition
50%
Vapor Phase
100%
Wear-resistant Coatings
50%
Engineering
Application Area
50%
Average Grain Size
50%
Chemical Vapor Deposition
50%
Crystal Structure
50%
Defects
50%
Deposited Film
50%
Enhanced Diffusion
50%
Experimental Result
50%
Film Property
50%
Fundamental Process
50%
Growth Kinetics
50%
Ion Implantation
100%
Magnetic Recording
50%
Microelectronics
50%
Microstructure
50%
Phase Stability
50%
Polycrystalline
50%
Preferred Orientation
50%
Primary Ion
50%
Resistant Coating
50%
Thin Films
50%
Material Science
Chemical Vapor Deposition
25%
Crystal Growth
100%
Crystal Structure
25%
Film
100%
Grain Size
25%
Ion Implantation
50%
Molecular Beam Epitaxy
25%
Nucleation
50%
Optical Coating
25%
Plasma Deposition
25%
Single Crystal
25%
Thin Film Deposition
25%
Wear-Resistant Coating
25%