ROLE OF LOW-ENERGY ION/SURFACE INTERACTIONS DURING CRYSTAL GROWTH FROM THE VAPOR PHASE.

Keyphrases

• Low-energy Ions 100%
• Ion Bombardment 100%
• Ion-surface Interaction 100%
• Nucleation Kinetics 100%
• Vapor Phase 100%
• Crystal Growth 100%
• Wear-resistant Coatings 50%
• Microstructure 50%
• Electron Acceleration 50%
• Low Energy 50%
• Ion Irradiation 50%
• Diverse Applications 50%
• Single-crystalline Films 50%
• Preferential Sputtering 50%
• Epitaxial 50%
• Surface Segregation 50%
• Preferred Orientation 50%
• Thin Film Deposition 50%
• Model Experimental 50%
• Microelectronics 50%
• Polycrystalline Films 50%
• Average Grain Size 50%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 50%
• Ion Deposition 50%
• Phase Stability 50%
• Optical Coatings 50%
• Microchemistry 50%
• Defect Concentration 50%
• Enhanced Diffusion 50%
• Film Defects 50%
• Magnetic Recording 50%
• Film Properties 50%
• Crystal Stability 50%
• Growth Kinetics 50%
• Large Gap 50%

Engineering

• Ion Implantation 100%
• Thin Films 50%
• Polycrystalline 50%
• Chemical Vapor Deposition 50%
• Deposited Film 50%
• Defects 50%
• Crystal Structure 50%
• Magnetic Recording 50%
• Microstructure 50%
• Experimental Result 50%
• Microelectronics 50%
• Growth Kinetics 50%
• Preferred Orientation 50%
• Enhanced Diffusion 50%
• Fundamental Process 50%
• Average Grain Size 50%
• Phase Stability 50%
• Resistant Coating 50%
• Primary Ion 50%
• Film Property 50%
• Application Area 50%

Material Science

• Film 100%
• Crystal Growth 100%
• Nucleation 50%
• Ion Implantation 50%
• Wear-Resistant Coating 25%
• Single Crystal 25%
• Molecular Beam Epitaxy 25%
• Chemical Vapor Deposition 25%
• Grain Size 25%
• Thin Film Deposition 25%
• Crystal Structure 25%
• Optical Coating 25%
• Plasma Deposition 25%