Robust control of maximum photolithography overlay error in a pattern layer

Keyphrases

• Photolithography 100%
• Robust Control 100%
• Overlay Error 100%
• Wafer 33%
• Photolithography Process 33%
• Simulation-based 33%
• Control Strategy 33%
• Semiconductor Manufacturing 33%
• Optimal Control 33%
• Noise Terms 33%
• Control Command 33%
• Linear Programming 33%
• Robust Optimization Problem 33%
• Bounded Processes 33%
• Semiconductor Fab 33%

Engineering

• Optical Lithography 100%
• Illustrates 50%
• Optimisation Problem 50%
• Control Strategy 50%
• Linear Program 50%
• Semiconductor Manufacturing 50%
• Noise Term 50%
• Case Scenario 50%
• Control Command 50%
• Optimal Control 50%