Repetitive Hole-Mask Colloidal Lithography for the Fabrication of Large-Area Low-Cost Plasmonic Multishape Single-Layer Metasurfaces

Jun Zhao, Sarah Jaber, Paul Mulvaney, Paul V. Braun, Harald Giessen

Research output: Contribution to journalArticlepeer-review

Abstract

A novel fabrication method, multiple repetitions of hole-mask colloidal nanolithography, is introduced to create single-layer metasurfaces with complex, multishape plasmonic nanostructures that exhibit desired optical functionalities. Large-area and low-cost fabrication of different samples with independently tunable resonances are demonstrated. These single-layer metasurfaces may find applications as multiline surface-enhanced infrared absorption and broadband substrates. This fabrication method is particularly suited for the creation of large-area, single-layer C3-rotationally symmetric, 3D chiral metasurfaces, and this approach circumvents common problems with elliptical birefringence and can be utilized for interaction with chiral substances.

Original languageEnglish (US)
Pages (from-to)680-686
Number of pages7
JournalAdvanced Optical Materials
Volume3
Issue number5
DOIs
StatePublished - May 1 2015

Keywords

  • Chiral metasurfaces
  • Hole-mask colloidal lithography
  • Large-area low-cost complex plasmonics
  • Multiline spectra
  • Multishape single-layer metasurfaces

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

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