Repetitive Hole-Mask Colloidal Lithography for the Fabrication of Large-Area Low-Cost Plasmonic Multishape Single-Layer Metasurfaces

A novel fabrication method, multiple repetitions of hole-mask colloidal nanolithography, is introduced to create single-layer metasurfaces with complex, multishape plasmonic nanostructures that exhibit desired optical functionalities. Large-area and low-cost fabrication of different samples with independently tunable resonances are demonstrated. These single-layer metasurfaces may find applications as multiline surface-enhanced infrared absorption and broadband substrates. This fabrication method is particularly suited for the creation of large-area, single-layer C₃-rotationally symmetric, 3D chiral metasurfaces, and this approach circumvents common problems with elliptical birefringence and can be utilized for interaction with chiral substances.