Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching

Keyphrases

• Optics 100%
• Reflectivity 100%
• Plasma Etching 100%
• Extreme Ultraviolet 100%
• In Situ Hydrogen 100%
• Sn Removal 100%
• Hydrogen Radical 66%
• Parameter Space 33%
• Light-emitting 33%
• H2 Plasma 33%
• Laser Plasma 33%
• Removal Rate 33%
• Reactive Ion Etching 33%
• Sn Debris 33%
• Extreme Ultraviolet Lithography 33%
• Plasma Cleaning 33%
• Radical Flux 33%
• Ion Energy Flux 33%
• Radical Densities 33%

Material Science

• Reflectivity 100%
• Tin 100%
• Plasma Etching 100%
• Density 33%
• Lithography 33%
• Reactive Ion Etching 33%

Engineering

• Reflectance 100%
• Parameter Space 33%
• Ion Energy 33%
• Ultraviolet Light 33%
• Limiting Factor 33%
• Energy Flux 33%
• Removal Rate 33%
• Extreme-Ultraviolet Lithography 33%