Removal of particles from lithographic masks through plasma assisted cleaning by metastable atomic neutralization

W. M. Lytle, D. S. Szybilski, C. E. Das, R. Raju, V. Surla, M. J. Neumann, David N Ruzic

Research output: Contribution to journalConference articlepeer-review

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Keyphrases

Engineering

Physics

Material Science