Regularized phase reconstruction for sensing deep subwavelength perturbations on large-scale wafers

Jinlong Zhu, Lynford L. Goddard

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrate that deep subwavelength scale perturbations on large-scale wafers can be inspected using a regularized phase metrology method. This work paves the route to reference-free defect inspection for nanostructures at advanced technology nodes.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO_AT 2019
PublisherOSA - The Optical Society
ISBN (Print)9781943580576
DOIs
StatePublished - Jan 1 2019
EventCLEO: Applications and Technology, CLEO_AT 2019 - San Jose, United States
Duration: May 5 2019May 10 2019

Publication series

NameOptics InfoBase Conference Papers
VolumePart F127-CLEO_AT 2019

Conference

ConferenceCLEO: Applications and Technology, CLEO_AT 2019
CountryUnited States
CitySan Jose
Period5/5/195/10/19

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ASJC Scopus subject areas

  • Mechanics of Materials
  • Electronic, Optical and Magnetic Materials

Cite this

Zhu, J., & Goddard, L. L. (2019). Regularized phase reconstruction for sensing deep subwavelength perturbations on large-scale wafers. In CLEO: Applications and Technology, CLEO_AT 2019 (Optics InfoBase Conference Papers; Vol. Part F127-CLEO_AT 2019). OSA - The Optical Society. https://doi.org/10.1364/CLEO_AT.2019.ATh1K.5