Reactive ballistic deposition of porous TiO2 films: Growth and characterization

David W. Flaherty, Zdenek Dohnálek, Alice Dohnálková, Bruce W. Arey, David E. McCready, Nachimuthu Ponnusamy, C. Buddie Mullins, Bruce D. Kay

Research output: Contribution to journalArticlepeer-review

Abstract

Nanoporous, high-surface area films of TiO2 are synthesized by reactive ballistic deposition of titanium metal in an oxygen ambient. Auger electron spectroscopy (AES) is used to investigate the stoichiometric dependence of the films on growth conditions (surface temperature and partial pressure of oxygen). Scanning and transmission electron microscopies show that the films consist of arrays of separated filaments. The surface area and the distribution of binding site energies of the films are measured as functions of growth temperature, deposition angle, and annealing conditions using temperature programmed desorption (TPD) of N2. TiO2 films deposited at 50 K at 70° from substrate normal display the greatest specific surface area of ∼100 m2/g. In addition, the films retain greater than 70% of their original surface area after annealing to 600 K. The combination of high surface area and thermal stability suggests that these films could serve as supports for applications in heterogeneous catalysis.

Original languageEnglish (US)
Pages (from-to)4765-4773
Number of pages9
JournalJournal of Physical Chemistry C
Volume111
Issue number12
DOIs
StatePublished - Mar 29 2007
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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