Abstract
We report fabrication and characterization of a 0.25-µm gate ion-implanted GaAs MESFET with a maximum current-gain cutoff frequency ft of 126 GHz. Extrapolation of current gains from biasdependent 5-parameters at 70-100 percent of Idssyields ft’s of 108-126 GHz. It is projected that an ft of 320 GHz is achievable with 0.1-µm gate GaAs MESFET’s. This clear demonstration of ft’s over 100 GHz with practical 0.25-µm gate length substantially advances the high-frequency operation limits of short-gate GaAs MESFET’s.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 386-388 |
| Number of pages | 3 |
| Journal | IEEE Electron Device Letters |
| Volume | 10 |
| Issue number | 8 |
| DOIs | |
| State | Published - Aug 1989 |
| Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
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