Quarter-Micrometer Gate Ion-Implanted GaAs MESFET’s with an ftof 126 GHz

G. W. Wang, Milton Feng

Research output: Contribution to journalArticlepeer-review

Abstract

We report fabrication and characterization of a 0.25-µm gate ion-implanted GaAs MESFET with a maximum current-gain cutoff frequency ft of 126 GHz. Extrapolation of current gains from biasdependent 5-parameters at 70-100 percent of Idssyields ft’s of 108-126 GHz. It is projected that an ft of 320 GHz is achievable with 0.1-µm gate GaAs MESFET’s. This clear demonstration of ft’s over 100 GHz with practical 0.25-µm gate length substantially advances the high-frequency operation limits of short-gate GaAs MESFET’s.

Original languageEnglish (US)
Pages (from-to)386-388
Number of pages3
JournalIEEE Electron Device Letters
Volume10
Issue number8
DOIs
StatePublished - Aug 1989
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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