Pulsed metal-organic chemical vapor deposition of high-quality AlN/GaN superlattices for near-infrared intersubband transitions

Keyphrases

• Metal-organic Chemical Vapor Deposition (MOCVD) 100%
• Superlattices 100%
• Intersubband Transitions 100%
• Near-infrared 100%
• Indium 33%
• GaN Layers 33%
• Tunability 33%
• Structural Quality 33%
• AlN Layer 33%
• Chemical Vapor Deposition Technique 33%
• Surface Quality 33%
• Optical Communications 33%
• Interband Absorption 33%
• Transition Characteristics 33%
• Communication Wavelength 33%

Material Science

• Metal-Organic Chemical Vapor Deposition 100%
• Superlattice 100%
• Aluminum Nitride 100%
• Indium 33%

Engineering

• Metal Organic Chemical Vapor Deposition 100%