Protecting wafer surface during plasma ignition using an arsenic cap

Keyphrases

• Arsenic 100%
• Wafer Surface 100%
• Plasma Ignition 100%
• Molecular Beam Epitaxy 50%
• Wafer 50%
• Transmission Electron Microscopy 50%
• Shutter 50%
• Plasma-assisted Molecular Beam Epitaxy 50%
• Sharp Feature 50%
• Photoluminescence Intensity 50%
• Direct Exposure 50%
• Semiconductor Surface 50%
• Laser Threshold 50%
• Indirect Exposure 50%
• Reactive Nitrogen 50%
• Dilute Nitrides 50%
• GaInNAs 50%
• Gate Valve 50%
• Indirect Damage 50%

Engineering

• Ignition 100%
• Arsenic 100%
• Transmissions 50%
• Semiconductor Surface 50%
• Dilute Nitride 50%
• Gate Valve 50%