Abstract
The properties of a GaN Metal-Semiconductor Field Effect Transistor were studied based on two-dimensional full band Monte Carlo simulations. The dependences of the distributions of the electric potential, electron concentration, electric field, drift velocity, and average electron energy on the gate-source voltage (VGS) and drain-source voltage (V DS) were obtained, then the characteristics of the drain current (IDS) versus the drain-source voltage (VDS) and the transconductance (Gm) versus VGS characteristics were determined. At VDS=15V and VGS=0V, IDS is 5.03 A/cm, which is higher value. The Gm-VGS curve shows bell shaped and the maximum Gm is 112 ms/mm at VDS=15V and VGS=1.5V. The current gain cutoff frequency (fT) is 98GHz at VDS=15V and VGS=0V.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 117-123 |
| Number of pages | 7 |
| Journal | Microelectronics Journal |
| Volume | 35 |
| Issue number | 2 |
| DOIs | |
| State | Published - Feb 2004 |
Keywords
- Gallium nitride
- Metal-semiconductor field effect transistor
- Monte carlo simulation
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering