Programmable chemical gradient patterns by soft grayscale lithography

Keyphrases

• Chemical Gradient 100%
• Gradient Pattern 100%
• Grayscale Lithography 100%
• Microfluidics 50%
• Irradiation 50%
• Non-specific Interaction 50%
• Polydimethylsiloxane 50%
• Non-native Substrate 50%
• Surface Properties 50%
• Grayscale 50%
• Covalent Bonding 50%
• Photocleavable 50%
• Grayscale Pattern 50%
• Amplitude Mask 50%
• Polar Groups 50%
• Planar Substrate 50%
• Functional Chemistry 50%
• Coumarin-based 50%
• Functional Groups 25%
• Surface Energy 25%
• Condensation 25%
• Spatial Resolution 25%
• UV Light 25%
• Microscopy 25%
• Contact Angle 25%
• Self-supporting 25%
• Imaging Mode 25%
• Surface Modification Process 25%
• Interaction Surface 25%
• Spatial Concentration 25%
• Gating System 25%
• Passive Pressure 25%
• Photocleavage 25%
• Proof-of-concept Demonstration 25%
• Grayscale Mask 25%
• Time-of-flight Secondary Ion Mass Spectrometry (ToF-SIMS) 25%
• Spatial Layout 25%
• Energy Charge 25%
• Emulsion 25%
• Pressure Sensitivity 25%
• Model Surfaces 25%
• Carbon Black 25%
• Inherent Flexibility 25%
• Vacuum Delivery 25%

Material Science

• Monolayers 100%
• Lithography 100%
• Surface Property 100%
• Density 50%
• Secondary Ion Mass Spectrometry 50%
• Surface Energy 50%
• Contact Angle 50%
• Dilution 50%
• Surface Modification 50%

Engineering

• Lithography 100%
• Grayscale 100%
• Engineering 28%
• Polydimethylsiloxane 28%
• Hydrophobic 28%
• Monolayer 28%
• Covalent 28%
• Molecular Level 28%
• Polar Group 28%
• Amplitude Mask 28%
• Functional Group 14%
• Dilution 14%
• Energy Surface 14%
• Time-of-Flight 14%
• Proof-of-Concept 14%
• Black Carbon 14%
• Mode Time 14%
• Surface Model 14%