Probing of Cu presence at Ta-SiO2 interfaces by second harmonic generation measurement

S. H. Tey; E. G. Seebauer; K. Prasad; K. C. Tee; L. H. Chan

doi:10.1109/COMMAD.2002.1237305

Probing of Cu presence at Ta-SiO₂ interfaces by second harmonic generation measurement

S. H. Tey, E. G. Seebauer, K. Prasad, K. C. Tee, L. H. Chan

Chemical and Biomolecular Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this paper, we have demonstrated for the first time that optical second harmonic generation (SHG) measurement can be used to probe Cu presence at the Ta-SiO₂ interfaces. We report here the details of our experimental procedures and investigation results. This technique shows tremendous potential in surface and interface microanalysis for Cu presence at these regions.

Original language	English (US)
Title of host publication	2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings
Editors	Michael Gal
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	523-526
Number of pages	4
ISBN (Electronic)	0780375718
DOIs	https://doi.org/10.1109/COMMAD.2002.1237305
State	Published - 2002
Event	Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Sydney, Australia Duration: Dec 11 2002 → Dec 13 2002

Publication series

Name	Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
Volume	2002-January

Other

Other	Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002
Country/Territory	Australia
City	Sydney
Period	12/11/02 → 12/13/02

ASJC Scopus subject areas

Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials

Online availability

10.1109/COMMAD.2002.1237305

Library availability

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Cite this

Tey, S. H., Seebauer, E. G., Prasad, K., Tee, K. C., & Chan, L. H. (2002). Probing of Cu presence at Ta-SiO₂ interfaces by second harmonic generation measurement. In M. Gal (Ed.), 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings (pp. 523-526). Article 1237305 (Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD; Vol. 2002-January). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/COMMAD.2002.1237305

Probing of Cu presence at Ta-SiO₂ interfaces by second harmonic generation measurement. / Tey, S. H.; Seebauer, E. G.; Prasad, K. et al.
2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings. ed. / Michael Gal. Institute of Electrical and Electronics Engineers Inc., 2002. p. 523-526 1237305 (Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD; Vol. 2002-January).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Tey, SH, Seebauer, EG, Prasad, K, Tee, KC & Chan, LH 2002, Probing of Cu presence at Ta-SiO₂ interfaces by second harmonic generation measurement. in M Gal (ed.), 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings., 1237305, Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD, vol. 2002-January, Institute of Electrical and Electronics Engineers Inc., pp. 523-526, Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002, Sydney, Australia, 12/11/02. https://doi.org/10.1109/COMMAD.2002.1237305

Tey SH, Seebauer EG, Prasad K, Tee KC, Chan LH. Probing of Cu presence at Ta-SiO₂ interfaces by second harmonic generation measurement. In Gal M, editor, 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings. Institute of Electrical and Electronics Engineers Inc. 2002. p. 523-526. 1237305. (Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD). doi: 10.1109/COMMAD.2002.1237305

Tey, S. H. ; Seebauer, E. G. ; Prasad, K. et al. / Probing of Cu presence at Ta-SiO₂ interfaces by second harmonic generation measurement. 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings. editor / Michael Gal. Institute of Electrical and Electronics Engineers Inc., 2002. pp. 523-526 (Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD).

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