Abstract
Surfactant-resistant polymersomes have substantial potential to be used as delivery vehicles in industrial applications. Herein, we report the preparation of poly(ethylene oxide)-block-polystyrene copolymers with ultrahigh hydrophobic-block molecular weights through RAFT dispersion polymerization, which allows the polymerization-induced self-assembly into well-defined polymersomes with ultrathick membranes up to ∼47 nm. These ultrathick membranes significantly enhance the resistance against surfactant solubilization of the vesicles, improving the vesicles' potential for use in industrial encapsulations. Vesicle-encapsulated actives are well retained in the presence of up to 40 wt % of various anionic and nonionic surfactants, with less than 7% active leakage being observed after 30 days.
Original language | English (US) |
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Pages (from-to) | 17033-17037 |
Number of pages | 5 |
Journal | ACS Applied Materials and Interfaces |
Volume | 8 |
Issue number | 27 |
DOIs | |
State | Published - Jul 13 2016 |
Keywords
- RAFT dispersion polymerization
- anionic and nonionic surfactants
- membrane thickness
- polymersome
- surfactant resistance
ASJC Scopus subject areas
- Materials Science(all)