Predictive surface kinetic analysis: the case of TiSi2 CVD

M. A. Mendicino; R. P. Southwell; E. G. Seebauer

Predictive surface kinetic analysis: the case of TiSi₂ CVD

M. A. Mendicino, R. P. Southwell, E. G. Seebauer

Chemical and Biomolecular Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

To study the kinetics of TiSi₂ desposition, a new experimental approach combining analysis during growth and in ultrahigh vacuum has been used. The H₂, HCl, SiCl₂, and SiH₃Cl were identified as volatile reaction products through the steady state growth experiments.

Original language	English (US)
Title of host publication	Gas-Phase and Surface Chemistry in Electronic Materials Processing
Publisher	Publ by Materials Research Society
Pages	63-68
Number of pages	6
ISBN (Print)	1558992332
State	Published - 1994
Event	Proceedings of the 1993 Fall Meeting of the Materials Research Society - Boston, MA, USA Duration: Nov 29 1993 → Dec 3 1993

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	334
ISSN (Print)	0272-9172

Other

Other	Proceedings of the 1993 Fall Meeting of the Materials Research Society
City	Boston, MA, USA
Period	11/29/93 → 12/3/93

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Library availability

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Cite this

Predictive surface kinetic analysis: the case of TiSi₂ CVD. / Mendicino, M. A.; Southwell, R. P.; Seebauer, E. G.
Gas-Phase and Surface Chemistry in Electronic Materials Processing. Publ by Materials Research Society, 1994. p. 63-68 (Materials Research Society Symposium Proceedings; Vol. 334).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Mendicino, MA, Southwell, RP & Seebauer, EG 1994, Predictive surface kinetic analysis: the case of TiSi₂ CVD. in Gas-Phase and Surface Chemistry in Electronic Materials Processing. Materials Research Society Symposium Proceedings, vol. 334, Publ by Materials Research Society, pp. 63-68, Proceedings of the 1993 Fall Meeting of the Materials Research Society, Boston, MA, USA, 11/29/93.

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abstract = "To study the kinetics of TiSi2 desposition, a new experimental approach combining analysis during growth and in ultrahigh vacuum has been used. The H2, HCl, SiCl2, and SiH3Cl were identified as volatile reaction products through the steady state growth experiments.",

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