Keyphrases
Secondary Ion Mass Spectrometry
100%
Reactive Magnetron Sputtering
100%
A-Si
100%
Complementary Error Function
66%
H Diffusion
66%
Mass Spectrometry Analysis
33%
Activation Energy
33%
Amorphous Silicon
33%
Diffusivity
33%
Amorphous Silicon Thin Film
33%
Dissociation
33%
Deuterium
33%
Exponential Decay
33%
Magnetron Sputtering
33%
Molecular Hydrogen
33%
Diffusion Kinetics
33%
Shallow Traps
33%
Deep Traps
33%
Hot Filament
33%
Dispersive Behaviour
33%
Dispersive Parameter
33%
Material Science
Secondary Ion Mass Spectrometry
100%
Film
100%
Magnetron Sputtering
100%
Amorphous Silicon
66%
Thin Films
33%
Activation Energy
33%
Diffusivity
33%
Deuterium
33%
Engineering
Magnetron
100%
Error Function
66%
Thin Films
33%
Activation Energy
33%
Diffusivity
33%
Exponential Decay
33%
Combined Effect
33%
Diffusion Kinetics
33%
Molecular Hydrogen
33%
Chemical Engineering
Magnetron Sputtering
100%
Film
100%
Deuterium
50%