Position Control of Self-Grown III-V Nanowire Arrays on Si Substrates via Micrometer-Size Patterns by Photolithography

Keyphrases

• Nanowires 100%
• Silicon Substrate 100%
• Micrometer Size 100%
• Photolithography 100%
• III-V Nanowires 100%
• Size Patterns 100%
• Position Control 100%
• Self-growing 100%
• Photolithography Process 66%
• Growth Temperature 33%
• GaAs Nanowires 33%
• Silicon(111) 33%
• III-V Semiconductors 33%
• Micrometer Scale 33%
• Heteroepitaxy 33%
• Hole Diameter 33%
• V(III) 33%
• Industry Standards 33%
• Conventional Photolithography 33%
• Hole Array 33%
• Growth Parameters 33%
• Growth Pressure 33%
• Closed Nature 33%
• Large-area Synthesis 33%
• Catalyst-free Growth 33%
• Contamination-free 33%

Material Science

• Silicon 100%
• Nanowire 100%
• III-V Semiconductor 14%
• Heteroepitaxy 14%