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Polarization-dependent laser-assisted plasma etching
David N Ruzic
(Inventor), Jason A Peck (Inventor)
University of Illinois Urbana-Champaign
Electrical and Computer Engineering
Nuclear, Plasma, and Radiological Engineering
Office of the Provost
Micro and Nanotechnology Lab
Coordinated Science Lab
Biomedical and Translational Sciences
Research output
:
Patent
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Physics & Astronomy
plasma etching
100%
polarization
47%
lasers
38%
polarized light
17%
pulsed lasers
15%
laser beams
12%