PLASMA OXIDATION AND 3d METAL DOPING OF HIGH-T//c SUPERCONDUCTORS.

L. H. Greene, B. G. Bagley, J. M. Tarascon, G. W. Hull

Research output: Contribution to journalConference article

Abstract

Oxygen intercalation in ceramic superconductors is accomplished near room temperature (T less than 80 degree C) with the plasma technique. Previously, temperatures of at least 500 degree C were required. Technologically, this technique allows oxygen uptake at temperatures compatible with device processing. Scientifically, the oxygen state of the bulk material can be precisely controlled as the sole variable; no disorder from elevated temperatures or ion damage ( less than 5 mw/cm**3) occurs. The oxygen deficient insulating semiconductors YBa//2Cu//3O//7// minus //y and La//2CuO//4// minus //y become bulk superconductors after plasma oxidation as shown both by the Meissner effect and the tetragonal to orthorhombic structural transition. Plasma oxidation of the pure T//c equals 55 K phase Y/Ba//2Cu//3O//6//. //6 reveals that no T//c between 55 K and 90 K (as measured magnetically and resistively) can be produced by oxygen uptake alone. Doping of La//1//. //8//5Sr//0//. //1//5Cu//1// minus //xM//xO//4// minus //y where M equals Ni, Zn and 0 less than x less than 0. 3 has been performed. Structural, magnetic and superconducting properties show that with increased x, the Jahn-Teller distortion is relaxed, the magnetic moment from the Ni is greater than that induced on the Cu by the Zn but T//c falls faster with Zn than Ni doping.

Original languageEnglish (US)
Number of pages1
JournalPhysica B: Physics of Condensed Matter & C: Atomic, Molecular and Plasma Physics, Optics
Volume148
Issue number1-3
StatePublished - Dec 1 1987
EventProc of the Yamada Conf XVIII on Supercond in Highly Correl Fermion Syst - Sendai, Jpn
Duration: Aug 31 1987Sep 3 1987

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'PLASMA OXIDATION AND 3d METAL DOPING OF HIGH-T//c SUPERCONDUCTORS.'. Together they form a unique fingerprint.

  • Cite this