Plasma Enhanced CO2 Recombination in EUV Drive Lasers

Andrew C. Herschberg, Nathan Bartlett, Jameson Crouse, David N. Ruzic

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

During plasma excitation of CO2 molecules in drive lasers, up to 60% of the CO2 decomposes into CO. Typically, Au is used as a catalyst to preferentially recombine CO and O radicals into CO2. While this can mitigate the decomposition of CO2, there is still a significant amount of CO present in the system. By adding a secondary, microwave driven plasma to the system at the location of the Au catalyst, O atoms can be stripped away from contaminants created in the laser such as Ox and NOx compounds. It is hypothesized that by increasing the number of O radicals at the catalytic surface, there will be a higher recombination efficiency, which is directly related to the efficiency of the CO2 drive laser and overall EUV production efficiency for use in semiconductor manufacturing. To test this hypothesis, a CO2 laser test platform has been constructed at the Center for Plasma-Material Interactions at the University of Illinois at Urbana-Champaign. This experimental chamber can operate under similar conditions to CO2 lasers currently used in EUV lithography systems. The system measures chemical species concentrations with the Gencoa OPTIX spectrometer and concentrations of O and N radicals using radical probes. This work serves as a status update on the project with preliminary results of the CO:CO2 ratio for the following four planned experiments: 1) Cu catalyst with secondary plasma inactive, 2) Cu catalyst with secondary plasma active, 3) Au with secondary plasma inactive, and 4) Au catalyst and secondary plasma active.

Original languageEnglish (US)
Title of host publicationOptical and EUV Nanolithography XXXVI
EditorsAnna Lio
PublisherSPIE
ISBN (Electronic)9781510660953
DOIs
StatePublished - 2023
Externally publishedYes
EventOptical and EUV Nanolithography XXXVI 2023 - San Jose, United States
Duration: Feb 27 2023Mar 2 2023

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume12494
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptical and EUV Nanolithography XXXVI 2023
Country/TerritoryUnited States
CitySan Jose
Period2/27/233/2/23

Keywords

  • CO Recombination
  • EUV Drive Laser
  • Gas Phase Chemistry
  • Gold Catalyst
  • Spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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