Plasma-Assisted Cleaning by Electrostatics (PACE)

Keyphrases

• Plasma-assisted 100%
• Pellicle 100%
• Cleaning Methods 66%
• Plasma Sheath 66%
• Nanoparticles 33%
• Size Reduction 33%
• Nanometer Scale 33%
• Electric Field (E-field) 33%
• Wafer 33%
• Particle Size 33%
• Fabrication Methods 33%
• Sulfuric Acid 33%
• Electric Charge 33%
• Difficult Problem 33%
• Particulate 33%
• Charge Imbalance 33%
• Destructive Behavior 33%
• Ultrasonic 33%
• Deionized Water 33%
• Rinsing 33%
• High Cost 33%
• Positive Bias 33%
• Sheath Region 33%
• Devolution 33%
• Plasma Cleaning 33%
• Reticle 33%
• Potential Drop 33%
• Residual Contamination 33%
• Semiconductor chips 33%
• Mask Cleaning 33%
• Cleaning Run 33%
• Acid Bath 33%
• Electrostatic Cleaning 33%
• Time to Charge 33%
• EUV Mask 33%
• Particle Contamination 33%

Engineering

• Electrostatics 100%
• Nanoparticle 50%
• Nanometre 50%
• Electric Field 50%
• Ultrasonics 50%
• Feature Size 50%
• Atmospheric Aerosol 50%
• Destructive Method 50%
• Electric Charge 50%
• Potential Drop 50%

Chemical Engineering

• Nanoparticle 100%
• Sulfuric Acid 100%
• Atmospheric Aerosol 100%