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Planarity of large MEMS
M. T.A. Saif
, N. C. MacDonald
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peer-review
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Keyphrases
Single Crystal
100%
Metallization
100%
Planarity
100%
Reactive Etching
100%
Cantilever Beam
75%
Multicrystalline Silicon
50%
Silica
50%
Etching Process
50%
Metallization Process
50%
Silicon Core
50%
Micromechanics
25%
Annealing
25%
Sidewall
25%
Oxides
25%
Thermal Strain
25%
Temperature Variation
25%
Nitrides
25%
Aluminum Film
25%
Linear Elastic Model
25%
Film Strain
25%
Large Cantilever
25%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
25%
Overhang
25%
Metallized
25%
Intrinsic Strain
25%
Coating Film
25%
Al Coating
25%
Temps
25%
Experimental Deformation
25%
Engineering
Microelectromechanical System
100%
Metallizations
100%
Cantilever Beam
50%
Silicon Single Crystal
33%
Silicon Dioxide
33%
Good Agreement
16%
Side Wall
16%
Room Temperature
16%
Nitride
16%
Feature Size
16%
Aluminum Film
16%
Systematic Approach
16%
Linear Elastic Model
16%