Photonic crystal membrane reflectors by magnetic field-guided metal-assisted chemical etching

Karthik Balasundaram, Parsian K. Mohseni, Yi Chen Shuai, Deyin Zhao, Weidong Zhou, Xiuling Li

Research output: Contribution to journalArticle

Abstract

Metal-assisted chemical etching (MacEtch) is a simple etching method that uses metal as the catalyst for anisotropic etching of semiconductors. However, producing nano-structures using MacEtch from discrete metal patterns, in contrast to interconnected ones, has been challenging because of the difficulties in keeping the discrete metal features in close contact with the semiconductor. We report the use of magnetic field-guided MacEtch (h-MacEtch) to fabricate periodic nanohole arrays in silicon-on-insulator (SOI) wafers for high reflectance photonic crystal membrane reflectors. This study demonstrates that h-MacEtch can be used in place of conventional dry etching to produce ordered nanohole arrays for photonic devices.

Original languageEnglish (US)
Article number214103
JournalApplied Physics Letters
Volume103
Issue number21
DOIs
StatePublished - Nov 18 2013

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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