Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: Photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors
Andrey E. Mironov, Jinhong Kim, Yin Huang, Austin W. Steinforth, Dane J. Sievers, J. Gary Eden
Research output: Contribution to journal › Article › peer-review
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