Patterning of supported gold monolayers via chemical lift-off lithography

  • Liane S. Slaughter
  • , Kevin M. Cheung
  • , Sami Kaappa
  • , Huan H. Cao
  • , Qing Yang
  • , Thomas D. Young
  • , Andrew C. Serino
  • , Sami Malola
  • , Jana M. Olson
  • , Stephan Link
  • , Hannu Häkkinen
  • , Anne M. Andrews
  • , Paul S. Weiss

Research output: Contribution to journalArticlepeer-review

Abstract

The supported monolayer of Au that accompanies alkanethiolate molecules removed by polymer stamps during chemical lift-off lithography is a scarcely studied hybrid material. We show that these Au-alkanethiolate layers on poly(dimethylsiloxane) (PDMS) are transparent, functional, hybrid interfaces that can be patterned over nanometer, micrometer, and millimeter length scales. Unlike other ultrathin Au films and nanoparticles, lifted-off Au-alkanethiolate thin films lack a measurable optical signature. We therefore devised fabrication, characterization, and simulation strategies by which to interrogate the nanoscale structure, chemical functionality, stoichiometry, and spectral signature of the supported Au-thiolate layers. The patterning of these layers laterally encodes their functionality, as demonstrated by a fluorescence-based approach that relies on dye-labeled complementary DNA hybridization. Supported thin Au films can be patterned via features on PDMS stamps (controlled contact), using patterned Au substrates prior tolift-off (e.g., selective wet etching), or by patterning alkanethiols on Au substrates to be reactive in selected regions but not others (controlled reactivity). In all cases, the regions containing Au-alkanethiolate layers have a sub-nanometer apparent height, which was found to be consistent with molecular dynamics simulations that predicted the removal of no more than 1.5 Au atoms per thiol, thus presenting a monolayer-like structure.

Original languageEnglish (US)
Pages (from-to)265
Number of pages1
JournalBeilstein Journal of Nanotechnology
Volume8
Issue number1
DOIs
StatePublished - 2017
Externally publishedYes

Keywords

  • Chemical patterning
  • Hybrid material
  • Monolayer
  • Soft lithography
  • Two-dimensional material

ASJC Scopus subject areas

  • General Materials Science
  • General Physics and Astronomy
  • Electrical and Electronic Engineering

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