Patterning colloidal films via evaporative lithography

Daniel J. Harris, Hua Hu, Jacinta C. Conrad, Jennifer A. Lewis

Research output: Contribution to journalArticlepeer-review


We investigate evaporative lithography as a route for patterning colloidal films. Films are dried beneath a mask that induces periodic variations between regions of free and hindered evaporation. Direct imaging reveals that particles segregate laterally within the film, as fluid and entrained particles migrate towards regions of higher evaporative flux. The films exhibit remarkable pattern formation that can be regulated by tuning the initial suspension composition, separation distance between the mask and underlying film, and mask geometry.

Original languageEnglish (US)
Article number148301
JournalPhysical review letters
Issue number14
StatePublished - Apr 5 2007

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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