Parallel fabrication on chemically etched silicon using scanning tunneling microscopy

X. Zheng, J. Hetrick, S. T. Yau, Munir H Nayfeh

Research output: Contribution to journalArticlepeer-review


We use a scanning tunneling microscope to fabricate nanometer-scale lithographic structures on chemically etched silicon sample. The process is believed to proceed by electron polymerization and activation of the reaction of the absorbed layer with the silicon surface. We study various aspects of the process, including resolution, density of adsorbates, and tip shape. We present results on the use of this method for fabrication of lines, and results which show parallel fabrication using tips that have multiple sharp peaks.

Original languageEnglish (US)
Pages (from-to)1303-1308
Number of pages6
Issue numberPART 2
StatePublished - Jul 1992

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

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