Oxide heterogrowth on ion-exfoliated thin-film complex oxide substrates

Tsung Liang Chen, Angela Kou, Avishai Ofan, Ophir Gaathon, R. M. Osgood, Oleg Gang, Lakshmanan Vanamurthy, Sasha Bakhru, Hassaram Bakhru

Research output: Contribution to journalArticlepeer-review


Fabrication of a bilayer HfO2/single-crystal LiNbO3 film is demonstrated using deep high-energy He+ implantation in a LiNbO3 wafer, followed by HfO2 atomic layer deposition, and, then, selective etching exfoliation from the bulk LiNbO3 crystal. The properties and morphology of these exfoliated bilayer films are characterized using a set of thin-film probes. Pre-exfoliation film patterning and one model application, in surface-refractive-index tuning of guided waves in a free-standing LiNbO3 film, are also demonstrated.

Original languageEnglish (US)
Pages (from-to)269-273
Number of pages5
JournalThin Solid Films
Issue number1
StatePublished - Nov 2 2009
Externally publishedYes


  • Atomic layer growth
  • Ion-implantation selective etching
  • Lift off
  • Thin-film LiNbO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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