Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

E. Vargas López, B. E. Jurczyk, M. A. Jaworski, M. J. Neumann, David N Ruzic

Research output: Contribution to journalConference article

Abstract

RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61±3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in-situ high-precision quartz crystal oscillators, ex-situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.

Original languageEnglish (US)
Pages (from-to)183-196
Number of pages14
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5374
Issue numberPART 1
DOIs
StatePublished - Aug 18 2004
EventEmerging Lithographic Technologies VIII - Santa Clara, CA, United States
Duration: Feb 24 2004Feb 26 2004

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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