TY - JOUR
T1 - Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources
AU - López, E. Vargas
AU - Jurczyk, B. E.
AU - Jaworski, M. A.
AU - Neumann, M. J.
AU - Ruzic, David N
N1 - Funding Information:
This work was performed under a research grant from INTEL Corp. # SRA 03–159. A portion of the work was carried out in the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U.S. Department of Energy under grant DEFG02-91-ER45439.
PY - 2004
Y1 - 2004
N2 - RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61±3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in-situ high-precision quartz crystal oscillators, ex-situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.
AB - RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61±3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in-situ high-precision quartz crystal oscillators, ex-situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.
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U2 - 10.1117/12.536405
DO - 10.1117/12.536405
M3 - Conference article
AN - SCOPUS:3843061155
SN - 0277-786X
VL - 5374
SP - 183
EP - 196
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
IS - PART 1
T2 - Emerging Lithographic Technologies VIII
Y2 - 24 February 2004 through 26 February 2004
ER -