Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

E. Vargas López; B. E. Jurczyk; M. A. Jaworski; M. J. Neumann; D. N. Ruzic

doi:10.1016/j.mee.2004.09.005

Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

E. Vargas López, B. E. Jurczyk, M. A. Jaworski, M. J. Neumann, D. N. Ruzic

Research output: Contribution to journal › Article › peer-review

Abstract

RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61 ± 3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in situ high-precision quartz crystal oscillators, ex situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.

Original language	English (US)
Pages (from-to)	95-102
Number of pages	8
Journal	Microelectronic Engineering
Volume	77
Issue number	2
DOIs	https://doi.org/10.1016/j.mee.2004.09.005
State	Published - Feb 2005

Keywords

DPF
Debris mitigation
Dense plasma focus
EUV
Ionization fraction
Lithography
RF plasma
Secondary plasma

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

Online availability

10.1016/j.mee.2004.09.005

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title = "Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources",

abstract = "RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61 ± 3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in situ high-precision quartz crystal oscillators, ex situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.",

keywords = "DPF, Debris mitigation, Dense plasma focus, EUV, Ionization fraction, Lithography, RF plasma, Secondary plasma",

author = "L{\'o}pez, {E. Vargas} and Jurczyk, {B. E.} and Jaworski, {M. A.} and Neumann, {M. J.} and Ruzic, {D. N.}",

note = "Funding Information: This work was performed under a research grant from INTEL Corp. # SRA 03–159. Funding Information: A portion of the work was carried out in the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U.S. Department of Energy under grant DEFG02-91-ER45439.",

year = "2005",

month = feb,

doi = "10.1016/j.mee.2004.09.005",

language = "English (US)",

volume = "77",

pages = "95--102",

journal = "Microelectronic Engineering",

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T1 - Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

AU - López, E. Vargas

AU - Jurczyk, B. E.

AU - Jaworski, M. A.

AU - Neumann, M. J.

AU - Ruzic, D. N.

N1 - Funding Information: This work was performed under a research grant from INTEL Corp. # SRA 03–159. Funding Information: A portion of the work was carried out in the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U.S. Department of Energy under grant DEFG02-91-ER45439.

PY - 2005/2

Y1 - 2005/2

N2 - RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61 ± 3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in situ high-precision quartz crystal oscillators, ex situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.

AB - RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61 ± 3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in situ high-precision quartz crystal oscillators, ex situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.

KW - DPF

KW - Debris mitigation

KW - Dense plasma focus

KW - EUV

KW - Ionization fraction

KW - Lithography

KW - RF plasma

KW - Secondary plasma

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JO - Microelectronic Engineering

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ER -

Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

Abstract

Keywords

ASJC Scopus subject areas

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