Origin of debris in EUV sources and its mitigation

Research output: Chapter in Book/Report/Conference proceedingChapter

Original languageEnglish (US)
Title of host publicationEUV Sources for Lithography
PublisherSPIE
Pages957-993
Number of pages37
ISBN (Electronic)9780819480712
ISBN (Print)0819458457, 9780819458452
DOIs
StatePublished - Feb 23 2006

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Extreme ultraviolet lithography
Debris

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Origin of debris in EUV sources and its mitigation. / Ruzic, David N.

EUV Sources for Lithography. SPIE, 2006. p. 957-993.

Research output: Chapter in Book/Report/Conference proceedingChapter

Ruzic, David N. / Origin of debris in EUV sources and its mitigation. EUV Sources for Lithography. SPIE, 2006. pp. 957-993
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