Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives

Keyphrases

• Metal Derivatives 100%
• Organometallic Compounds 100%
• Deuterium 66%
• Alkyl 66%
• Aryl 66%
• Siloxy 66%
• Electronic Devices 33%
• Chemical Vapor Deposition 33%
• Valence 33%
• Iridium 33%
• One-group 33%
• Palladium 33%
• Manganese 33%
• Iron-nickel Alloy 33%
• Metal Film 33%
• Cobalt 33%
• Metal-containing 33%
• Metal Deposition 33%
• Alkyl Group 33%
• Silyl 33%
• Chemical Deposition 33%
• Rhodium 33%
• Osmium 33%
• Technetium 33%
• Rhenium 33%
• Nickel-ruthenium 33%

Material Science

• Film 100%
• Deuterium 100%
• Cobalt 100%
• Chemical Vapor Deposition 50%
• Platinum 50%
• Metal Film 50%
• Ruthenium 50%
• Palladium 50%
• Manganese 50%
• Iridium 50%
• Osmium 50%
• Rhodium 50%
• Rhenium 50%
• Technetium 50%

Chemical Engineering

• Organometallics 100%
• Film 100%
• Deuterium 66%
• Vapor Deposition 33%
• Chemical Vapor Deposition 33%
• Rhenium 33%
• Technetium 33%