Keyphrases
Extreme Ultraviolet
100%
Discharge Produced Plasma
100%
Exposure Characterization
100%
Ultraviolet System
100%
Optics
60%
Reflectivity
40%
Degradation Mechanism
40%
Surface Roughness
40%
Auger Electron Spectroscopy
40%
EUV Source
40%
Scanning Electron Microscopy
20%
Self-healing
20%
Oxides
20%
Atomic Force Microscopy
20%
Spectroscopic Measurement
20%
Film Thickness
20%
Surface Chemistry
20%
Depth Profile
20%
Diffusion Effect
20%
Hydrocarbons
20%
Au Layer
20%
Mixing Effect
20%
Exposure Time
20%
Surface Interaction
20%
Material Characterization
20%
Surface Enhancement
20%
Microscopy Electron
20%
Microanalysis
20%
Multilayer Film
20%
Surface Film
20%
Multiple Samples
20%
Deposition Effect
20%
Laser Plasma
20%
Surface Analysis
20%
Grazing Incidence
20%
Change of Measure
20%
Co-sputtering
20%
Exposure Effects
20%
Neutral Particles
20%
Surface Contamination
20%
Sn-based
20%
Sn Ions
20%
EUV Lithography
20%
SnCl4
20%
Erosion Mechanism
20%
Roughness Properties
20%
Solid Particle Erosion
20%
High Volume Manufacturing
20%
Erosion Assessment
20%
Plasma Interaction
20%
Plasma Erosion
20%
Debris Deposition
20%
Ru Films
20%
Erosion Effect
20%
Manufacturing Tool
20%
Mirror Degradation
20%
Xe Plasma
20%
Change in Surface Roughness
20%
Film Analysis
20%
Contamination Layer
20%
Optics Lifetime
20%
Au Alloys
20%
Sn Diffusion
20%
Tool Condition
20%
Erosion Resistance
20%
Hot Mirror
20%
Simultaneous Deposition
20%
Engineering
Degradation Mechanism
100%
Reflectance
100%
Energetics
50%
Atomic Force Microscopy
50%
Lithography
50%
Depth Profile
50%
Multilayer Film
50%
Multiple Sample
50%
Exposure Time
50%
Plasma Interaction
50%
Exposure Effect
50%
Erosion Resistance
50%
Manufacturing Tool
50%